chemical vapor deposition (CVD)
chemical vapor deposition (CVD)
High-temperature (1,000° C or higher), atmosphere-controlled process in which a chemical reaction is induced for the purpose of depositing a coating 2µm to 12µm thick on a tool’s surface. See coated tools; PVD, physical vapor deposition.
High-temperature (1,000° C or higher), atmosphere-controlled process in which a chemical reaction is induced for the purpose of depositing a coating 2µm to 12µm thick on a tool’s surface. See coated tools; PVD, physical vapor deposition.
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